Mattson Technology, Inc. designs, manufactures, markets, and supports semiconductor wafer processing equipment used in the fabrication of integrated circuits (ICs) worldwide. Its dry strip products include SUPREMA strip systems that feature Faraday-Shielded inductively coupled plasma (ICP) technology, which offers resist dry strip capability to edge memory and foundry/logic customers. The company’s etch products consists of the paradigmE and Alpine systems that feature proprietary Faraday-Shielded ICP plasma source combined with etch bias control for production and process development at advanced memory and foundry/logic wafer fabs. Its conventional rapid thermal processing products include the Helios XP for use in IC production based on its dual side wafer heating and differential thermal energy control; and Millisecond Anneal products comprise Millios system, which features an arc lamp technology capable of reducing thermal cycle time for gate anneal and activation process requirements. The company sells its products directly, as well as through distribution agreements to memory, foundry, and logic device manufacturers. Mattson Technology, Inc. was founded in 1988 and is headquartered in Fremont, California.